Epoch has been developing CMP slurry since 1996, by continuous improvement and close cooperation with customers , Epoch became the first Taiwanese CMP slurry supplier with HVM in the world market. We provide products to all major domestic and foreign IC and LCD manufacturers for their production.

CMP copper process
Copper CMP slurry : EPL2361, EPL2362, EPL3000 series with optimized removal rate for copper layer with minimum defect. Copper CMP pad cleaning solution : EPL8151 can effectively activate and cleanse the surface of polishing pad surface during copper processing, to extend pad life. Post CMP cleaning solution: EPL8153 provides excellent surface cleansing effect for wafers, resulting in a maximum clean surface.   Color filter polish EPL301 series can effective polish performance for the photoresist in the color filter process.   BTA EPLB10 series has quite satisfactory effect on the inhibition for copper film oxidization.   3M CUNO Filter 3M CUNO Filter provides precise filtration performance for CMP slurry, DI water and Chemical, Epoch also provide the analytical service for related filtration solutions.   Specific application We also develop customized products for specific application to satisfy your special requirements.
If you were interested in gaining more information for our products,please contact Global business manager. E-MAIL: samuel_huang@epocheternal.com